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高純度大宗化學品
高純度大宗化學品
| 品名 | 敘述 | 詢價 |
|---|---|---|
| 醋酸 (CH3COOH) | 用於光刻和清潔過程中，去除有機殘留物並改善光刻膠的附著力。 | |
| Hydrogen Peroxide (H2O2) | ||
| Nitric Acid (HNO3) | ||
| Phosphoric Acid (H3PO4) | ||
| Sulfuric Acid (H2SO4) | ||
| Ammonium Hydroxide (NH4OH) | ||
| Potassium Hydroxide solution (KOH) | ||
| Sodium Hydroxide solution (NaOH) | ||
| Tetramethylammonium Hydroxide solution (TMAH) | ||
| Acetone | ||
| n-Butyl Acetate (NBA) | ||
| Isopropanol (IPA) |