蝕刻劑

品名	敘述	詢價
MAE 295 Series	MAE 295 series are formulated chemicals designed specifically for etching of Cu layer and Cu/Mo stacked layers. MAE 295 series are formulas based on H2O2 and provide appropriate etching profile to satisfy LCD process application.
Cu Etchants	MAE 295 series are formulated chemicals designed specifically for etching of Cu layer and Cu/Mo stacked layers. MAE 295 series are formulas based on H2O2 and provide appropriate etching profile to satisfy LCD process application.
MAE 420 series	MAE 420 series are formulated chemicals designed specifically for etching of Mo (alloy), Mo(Nb)/Al(Nd), Mo(Nb)/Al(Nd)/Mo(Nb). MAE 420 series are formulas based on H3PO4, HNO3 and CH3COOH and provide appropriate etching profile to satisfy process application.
Mo Etchant	MAE 420 series are formulated chemicals designed specifically for etching of Mo (alloy), Mo(Nb)/Al(Nd), Mo(Nb)/Al(Nd)/Mo(Nb). MAE 420 series are formulas based on H3PO4, HNO3 and CH3COOH and provide appropriate etching profile to satisfy process application.
ITO Etchants	ITO Etch series are formulated chemicals designed specifically for etching of amorphous ITO. ITO Etch series are formulas based on oxalic acid or dilute aqua regia.