蝕刻劑

品名	敘述	詢價
Al Etch Series	IC, Logic, Etchant Al Etch series are functional chemicals designed specifically for etching of Al(alloy), Mo(Nb)/Al(Nd), Mo(Nb)/Al(Nd)/Mo(Nb). The Al Etch series can be tailored to meet the specific needs of end users.
Aluminum Etchants	IC, Logic, Etchant Al Etch series are functional chemicals designed specifically for etching of Al(alloy), Mo(Nb)/Al(Nd), Mo(Nb)/Al(Nd)/Mo(Nb). The Al Etch series can be tailored to meet the specific needs of end users.
BOE & BHF Series	IC, Logic, Memory, Etchant BOE and BHF are HF and NH4F based formulated chemicals designed specifically for etching of SiO2 and SiN. BHF series etchants contain surfactant, which enhances wettability and achieves etching uniformity.
Oxide Etchants	IC, Logic, Memory, Etchant BOE and BHF are HF and NH4F based formulated chemicals designed specifically for etching of SiO2 and SiN. BHF series etchants contain surfactant, which enhances wettability and achieves etching uniformity.
HSE Series	IC, Logic, 7nm, 5nm HSE series etchants are formulated chemicals designed specifically for high selective etching for different materials, such as SiO2/SiN, TiSi/TiN and Si orientation<111>/<100>.
High Selective Etchants	IC, Logic, 7nm, 5nm HSE series etchants are formulated chemicals designed specifically for high selective etching for different materials, such as SiO2/SiN, TiSi/TiN and Si orientation<111>/<100>.
Poly Series	IC, logic, legacy, advanced process Poly series etchants are formulated chemicals designed specifically for isotropic etching of Si. A wide variety of recipes are available to meet the demands of customers.
Polysilicon Etchants	IC, logic, legacy, advanced process Poly series etchants are formulated chemicals designed specifically for isotropic etching of Si. A wide variety of recipes are available to meet the demands of customers.
MAE Series Etchants	MAE series etchants are formulated chemicals designed specifically for etching specific metal layers ranging from Cu, Co and W with high selectivity to other metal layers.